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1

Step-and-Repeat Photo-Nanoimprint System Using Active Orientation Head

Hiroshima, Hiroshi, Komuro, Masanori, Kurashima, Yuichi, Kim, Sang Hoon, Muneishi, Takeshi

Journal:

Japanese Journal of Applied Physics

Year:

2004

Language:

english

File:

PDF, 269 KB

english, 2004

2

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Photomask etch and profile control of 65nm chromeless phase lithography masks using scanning probe metrology

Anderson, Scott A., Komuro, Masanori, Buxbaum, Alex, Kumar, Ajay, Ibrahim, Ibrahim

Year:

2005

Language:

english

File:

PDF, 419 KB

english, 2005

3

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - AUV5500: advanced in situ dry cleaning and metrology process for next generation lithography

Chovino, Christian, Komuro, Masanori, Helbig, Stefan, Dress, Peter

Year:

2005

Language:

english

File:

PDF, 199 KB

english, 2005

4

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Chip level lithography verification system with artificial neural networks

Shin, Jae-pil, Komuro, Masanori, Choi, Jin-sook, Jung, Dae-hyun, Lee, Jee-hyong, Yoo, Moon-hyun, Kong, Jeong-taek

Year:

2005

Language:

english

File:

PDF, 94 KB

english, 2005

5

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Evaluations of optical performance for micro-trench on quartz etch in ArF lithography

Ahn, Won-Suk, Komuro, Masanori, Kwon, Hyuk-Joo, Moon, Seong-Yong, Choi, Seong-Woon, Han, Woo-Sung

Year:

2005

Language:

english

File:

PDF, 395 KB

english, 2005

6

Exergy-entropy process of passive solar heating and global environmental systems

Masanori Shukuya, Daisuke Komuro

Journal:

Year:

1996

Language:

english

File:

PDF, 788 KB

english, 1996

7

Ion beam exposure apparatus using a liquid metal source

Masanori Komuro

Journal:

Thin Solid Films

Year:

1982

Language:

english

File:

PDF, 783 KB

english, 1982

8

Influences of tendon stiffness, joint stiffness, and electromyographic activity on jump performances using single joint

Keitaro Kubo, Masanori Morimoto, Teruaki Komuro, Naoya Tsunoda, Hiroaki Kanehisa, Tetsuo Fukunaga

Journal:

European Journal of Applied Physiology

Year:

2007

Language:

english

File:

PDF, 201 KB

english, 2007

9

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - 65nm mask CD qualification on critical features through simulation based lithography verification

van Adrichem, Paul J. M., Valadez, John, Ziger, David, Gerold, Dave, Komuro, Masanori

Year:

2005

Language:

english

File:

PDF, 143 KB

english, 2005

10

Maskless etching of a nanometer structure by focused ion beams

Komuro, Masanori

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1983

Language:

english

File:

PDF, 989 KB

english, 1983

11

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Lithography process related OPC development and verification demonstration on a sub-90nm poly layer

Hung, Chi-Yuan, Liu, Qingwei, Zhang, Liguo, Shang, Shumay, Jost, Andrew, Komuro, Masanori

Year:

2005

Language:

english

File:

PDF, 530 KB

english, 2005

12

Broad-Pulsed Ga Ion-Beam-Assisted Etching of Si with Cl 2

Haraichi, Satoshi, Komuro, Masanori

Journal:

Japanese Journal of Applied Physics

Year:

1993

File:

PDF, 997 KB

1993

13

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Effects of mask bias on the mask error enhancement factor (MEEF) for low k1 lithography process

Chang, Yu Y., Komuro, Masanori, Wu, Yuan-Hsun, Shih, Chiang-Lin, Lin, Jengping, Kan, Francis, Lin, Jimmy

Year:

2005

Language:

english

File:

PDF, 236 KB

english, 2005

14

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Flexible sparse and dense OPC algorithms

Cobb, Nick, Komuro, Masanori

Year:

2005

Language:

english

File:

PDF, 176 KB

english, 2005

15

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Novel acid-free cleaning process for mask blanks

Koster, Harald, Komuro, Masanori, Branz, Karsten, Dietze, Uwe, Dress, Peter, Hess, Guenter

Year:

2005

Language:

english

File:

PDF, 374 KB

english, 2005

16

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Simulation of resist heating effect with e-beam lithography using distributed processing (DP)

Ki, Won-Tai, Komuro, Masanori, Ahn, Byung-Sup, Park, Ji-Soong, Choi, Seung-Woon, Ma, Sang-Back, Han, Woo-Sung

Year:

2005

Language:

english

File:

PDF, 252 KB

english, 2005

17

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Evaluation of quartz dry etching profile for the PSM lithography performance

Komizo, Toru, Komuro, Masanori, Nemoto, Satoru, Kojima, Yosuke, Ohshima, Takashi, Yoshii, Takashi, Konishi, Toshio, Chiba, Kazuaki, Kikuchi, Yasutaka, Otaki, Masao, Okuda, Yoshimitsu

Year:

2005

Language:

english

File:

PDF, 331 KB

english, 2005

18

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Investigation of defect repair methods for EUVL mask blanks through aerial-image simulations

Hashimoto, Takeo, Komuro, Masanori, Nishiyama, Iwao

Year:

2005

Language:

english

File:

PDF, 1.63 MB

english, 2005

19

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Efficient modeling of immersion lithography in an aggressive RET mask synthesis flow

Bai, Min, Komuro, Masanori, Lei, Junjiang, Zhang, Lin, Shiely, James P.

Year:

2005

Language:

english

File:

PDF, 81 KB

english, 2005

20

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Simulation based OPC for contact pattern using 193 nm lithography

Keck, Martin, Komuro, Masanori, Bodendorf, Christof, Thiele, Jorg, Gomez, Alberto L., Tseng, Ying-Chung, Huang, Teng-Yen

Year:

2005

Language:

english

File:

PDF, 251 KB

english, 2005

21

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - An efficient resolution enhancement technique flow for 65nm logic poly layer

van Adrichem, Paul J. M., Komuro, Masanori, Chacko, Manoj, Kasprowicz, Bryan S.

Year:

2005

Language:

english

File:

PDF, 90 KB

english, 2005

22

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - An automated mask defect analysis system for increasing mask shop productivity

Fiekowsky, Peter, Komuro, Masanori, Lewis, Christopher, McDonald, Andy

Year:

2005

Language:

english

File:

PDF, 198 KB

english, 2005

23

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Monitoring system of CD error analysis for the 90-nm node mask manufacturing

Yu, Sang-Yong, Komuro, Masanori, Kim, Soon-Ho, Cha, Byung-Cheol, Kim, Yong-Hoon, Choi, Seung-Woon, Yoon, Hee-Sun, Han, Woo-Sung

Year:

2005

Language:

english

File:

PDF, 337 KB

english, 2005

24

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Second level printing of advanced phase shift masks using DUV laser lithography

Howard, Charles, Komuro, Masanori, Park, Keun-Taek, Scherer, Marcus, Stankovic, Svetomir, Cantrell, Rusty, Herrmann, Mark

Year:

2005

Language:

english

File:

PDF, 258 KB

english, 2005

25

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - A study for polarized illumination effects in photo resist

Lei, Junjiang, Komuro, Masanori, Bai, Min, Shiely, Jim, Zhang, Lin

Year:

2005

Language:

english

File:

PDF, 332 KB

english, 2005

26

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Wafer topography-aware optical proximity correction for better DOF margin and CD control

Gupta, Puneet, Komuro, Masanori, Kahng, Andrew B., Park, Chul-Hong, Samadi, Kambiz, Xu, Xu

Year:

2005

Language:

english

File:

PDF, 758 KB

english, 2005

27

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Character-build standard-cell layout technique for high-throughput character-projection EB lithography

Fujino, Takeshi, Komuro, Masanori, Kajiya, Yoshihiko, Yoshikawa, Masaya

Year:

2005

Language:

english

File:

PDF, 529 KB

english, 2005

28

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Model-based full-chip verification for 65nm lithography process development

Kim, Juhwan, Komuro, Masanori, Wang, Lantian, Zhang, Daniel, Tang, Zongwu

Year:

2005

Language:

english

File:

PDF, 734 KB

english, 2005

29

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - The application of phase grating to CLM technology for the sub-65nm node optical lithography

Yoon, Gi-Sung, Komuro, Masanori, Kim, Sung-Hyuck, Park, Ji-Soong, Choi, Sun-Young, Jeon, Chan-Uk, Shin, In-Kyun, Choi, Sung-Woon, Han, Woo-Sung

Year:

2005

Language:

english

File:

PDF, 464 KB

english, 2005

30

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Process model quality assessment by sensitivity analysis

Yan, Qiliang, Komuro, Masanori, Melvin III, Lawrence S., Shiely, James P.

Year:

2005

Language:

english

File:

PDF, 91 KB

english, 2005

31

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Photomask lifetime issues in ArF lithography

Eschbach, Florence, Komuro, Masanori, Coon, Peter, Greenebaum, Barbara, Mittal, Anurag, Sanchez, Peter, Tanzil, Daniel, Ng, Grace, Yun, Henry, Sengupta, Archita

Year:

2005

Language:

english

File:

PDF, 345 KB

english, 2005

32

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Feasibility study of double exposure lithography for 65nm and 45nm node

Hsu, Stephen, Komuro, Masanori, Van Den Broeke, Douglas, Chen, J. F., Park, Jungchul, Hsu, Michael C. W.

Year:

2005

Language:

english

File:

PDF, 602 KB

english, 2005

33

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Application of a wafer development process to mask making

Lee, Gaston, Komuro, Masanori, Berger, Celine, Burgel, Christian, Feicke, Axel, Cantrell, Rusty, Tschinkl, Martin

Year:

2005

Language:

english

File:

PDF, 207 KB

english, 2005

34

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Methods to improve radiation sensitivity of chemically amplified resists by using chain reactions of acid generation

Nagahara, Seiji, Sakurai, Yusuke, Wakita, Masanori, Yamamoto, Yukio, Tagawa, Seiichi, Komuro, Masanori, Yano, Ei, Okazaki, Shinji, Houlihan, Francis M.

Year:

2000

Language:

english

File:

PDF, 404 KB

english, 2000

35

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low k1 lithography

Bhattacharyya, Kaustuve, Komuro, Masanori, Eickhoff, Mark, Ma, Mark, Pas, Sylvia

Year:

2005

Language:

english

File:

PDF, 313 KB

english, 2005

36

Age-Related Differences in the Properties of the Plantar Flexor Muscles and Tendons

KUBO, KEITARO, MORIMOTO, MASANORI, KOMURO, TERUAKI, TSUNODA, NAOYA, KANEHISA, HIROAKI, FUKUNAGA, TETSUO

Journal:

Medicine & Science in Sports & Exercise

Year:

2007

Language:

english

File:

PDF, 166 KB

english, 2007

37

Effects of Plyometric and Weight Training on Muscle-Tendon Complex and Jump Performance

KUBO, KEITARO, MORIMOTO, MASANORI, KOMURO, TERUAKI, YATA, HIDEAKI, TSUNODA, NAOYA, KANEHISA, HIROAKI, FUKUNAGA, TETSUO

Journal:

Medicine & Science in Sports & Exercise

Year:

2007

Language:

english

File:

PDF, 332 KB

english, 2007

38

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Reticle SEM specifications required for lithography simulation

Kariya, Mitsuyo, Komuro, Masanori, Yamanaka, Eiji, Tanaka, Satoshi, Ikeda, Takahiro, Yamaguchi, Shinji, Itoh, Masamitsu, Kobayashi, Hideaki, Kawashima, Tsukasa, Narukawa, Shogo

Year:

2005

Language:

english

File:

PDF, 366 KB

english, 2005

39

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Reducing alternating phase shift mask (Alt-PSM) write-time through mask data optimization

Kasprowicz, Bryan S., Komuro, Masanori, van Adrichem, Paul J. M., Chacko, Manoj

Year:

2005

Language:

english

File:

PDF, 91 KB

english, 2005

40

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Process monitoring system for instant defect detection and analysis in 65 nm node photomask fabrications

Cho, Young-Seok, Komuro, Masanori, Park, Jin-Hyung, Cho, Won-Il, Park, Jin-Hong, Kim, Yong-Hyun, Choi, Seong-Woon, Han, Woo-Sung

Year:

2005

Language:

english

File:

PDF, 239 KB

english, 2005

41

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography

Yoshizawa, Masaki, Komuro, Masanori, Philipsen, Vicky, Leunissen, Leonardus H. A.

Year:

2005

Language:

english

File:

PDF, 170 KB

english, 2005

42

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Evaluation of e-beam sensitive CARs for advanced mask making

Feicke, Axel, Komuro, Masanori, Irmscher, Mathias, Schwersenz, Anatol, Tschinkl, Martin

Year:

2005

Language:

english

File:

PDF, 2.62 MB

english, 2005

43

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy

Couderc, Christophe, Komuro, Masanori, Belledent, Jerome, Borjon, Amandine, Trouiller, Yorick, Sundermann, Frank, Lucas, Kevin, Urbani, Jean-Christophe, Foussadier, Franck, Rody, Yves, Patterson, Kyle

Year:

2005

Language:

english

File:

PDF, 380 KB

english, 2005

44

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Multi-layer masks: manufacturability considerations

Balasinski, Artur, Komuro, Masanori

Year:

2005

Language:

english

File:

PDF, 178 KB

english, 2005

45

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Photomask process development for next generation lithography

Sasaki, Shiho, Komuro, Masanori, Itoh, Kimio, Fujii, Akiko, Toyama, Nobuhito, Mohri, Hiroshi, Hayashi, Naoya

Year:

2005

Language:

english

File:

PDF, 579 KB

english, 2005

46

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - The capability of a 1.3NA μstepper using 3D EMF mask simulations

Conley, Will, Komuro, Masanori, Meute, Jeff, Webb, James, Goodman, Douglas, Maier, Robert

Year:

2005

Language:

english

File:

PDF, 261 KB

english, 2005

47

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Local IP evaluations of EPL reticle with 4 mm-sq Si membranes

Koike, Kaoru, Komuro, Masanori, Sakaue, Hiroshi, Arimoto, Hiroshi, Yamazaki, Tukasa, Sugimura, Hiroshi, Susa, Takashi, Ito, Kojiro, Tamura, Akira

Year:

2005

Language:

english

File:

PDF, 396 KB

english, 2005

48

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - RET masks for the final frontier of optical lithography

Chen, J. F., Komuro, Masanori, van den Broeke, Douglas, Hsu, Stephen, Hsu, Michael C. W., Laidig, Tom, Shi, Xuelong, Chen, Ting, Socha, Robert J., Hollerbach, Uwe, Wampler, Kurt E., Park, Jungchul, Pa

Year:

2005

Language:

english

File:

PDF, 3.53 MB

english, 2005

49

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Precision process calibration and CD predictions for low-k 1 lithography

Chen, Ting, Komuro, Masanori, Park, Sangbong, Berger, Gabriel, Coskun, Tamer H., de Vocht, Joep, Chen, Fung, Yu, Linda, Hsu, Stephen, van den Broeke, Doug, Socha, Robert, Park, Jungchul, Gronlund, Kei

Year:

2005

Language:

english

File:

PDF, 748 KB

english, 2005

50

Prevalence of antibody to adult T-cell leukemia virus-associated antigens (ATLA) in Japanese monkeys and other non-human primates

Masanori Hayami, Atsumi Komuro, Ken Nozawa, Takayoshi Shotake, Koh-Ichi Ishikawa, Kohtaro Yamamoto, Takafumi Ishida, Shigeo Honjo, Yorio Hinuma

Journal:

International Journal of Cancer

Year:

1984

Language:

english

File:

PDF, 436 KB

english, 1984

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